英飞凌以300毫米功率碳化硅晶圆标志着创新里程碑
Infineon marks innovation milestone with 300mm power silicon carbide wafer

原始链接: https://www.infineon.com/press-release/2026/infpr202611-028

英飞凌已成为首家在奥地利菲拉赫的全规模晶圆厂中,使用现有硅制造设备将300毫米碳化硅晶圆加工为功能性功率器件的公司。这一里程碑将在2026年慕尼黑electronica展会上展示,支持更高效的碳化硅生产——300毫米晶圆的芯片产量约为200毫米晶圆的2.3倍——并加强英飞凌对汽车、可再生能源、工业和AI数据中心应用的供应。公司还在德累斯顿展示了300毫米碳化硅的Cold Split可行性,以降低材料损耗和加工时间。英飞凌将与客户协调300毫米碳化硅的产能爬坡时机,并继续推进其200毫米路线图,同时最近宣布了氮化镓300毫米晶圆厂投资,巩固其在硅、碳化硅和氮化镓功率半导体领域的领导地位。

Hacker News 引用了英飞凌的公告,称其已在 300 毫米碳化硅晶圆上生产出行业首批功能功率器件,视其为创新里程碑,并作为未来向汽车、可再生能源、工业和 AI 数据中心客户供应碳化硅的基础。英飞凌将在 2026 年慕尼黑 electronica 展会上展示第一片已加工晶圆。评论包括要求在欧洲重启 DRAM 生产的请求;回复指出存储器封装复杂且目前不在欧洲进行,而另一位评论者强调功率半导体对国家安全和工业用例的重要性。
相关文章

原文
  • Infineon presents industry-first functional power devices processed on 300-millimeter silicon carbide wafers
  • Technological breakthrough underlines Infineon’s innovation strength and leadership in power semiconductors and wide-bandgap technologies
  • 300-millimeter SiC process feasibility lays the foundation for secure, future-proof SiC supply to customers in automotive, renewable energy, industrial and AI data center applications
  • Infineon will present the first processed 300-millimeter SiC wafer to the public at the electronica trade show starting 10 November 2026 in Munich

Munich, Germany – 09 November 2026 – Infineon Technologies AG (FSE: IFX / OTCQX: IFNNY) has successfully processed 300-millimeter silicon carbide wafers into functional power devices at its fab in Villach, Austria. Infineon is the first company to pioneer this innovation milestone in a full-scale semiconductor fab environment. It was realized by utilizing existing silicon (Si) manufacturing equipment. This early achievement of functional power devices reflects Infineon’s strong focus on providing customers with a comprehensive portfolio of high-performance SiC power semiconductors and ensuring long-term supply. Chip production on 300 mm wafers is technologically more advanced and significantly more efficient than 200 mm wafers, since the larger wafer diameter offers 2.3 times more chips per wafer.

“This technological milestone further strengthens our leadership in power systems. Congratulations and thank you to our passionate team, making significant progress in bringing 300-millimeter SiC out of the lab into a manufacturing environment,” said Jochen Hanebeck, CEO of Infineon Technologies. “Leadership in power semiconductors means continuously pushing technology to the next level. With silicon, gallium nitride and now silicon carbide 300-millimeter wafers, we are in a leading position to scale semiconductor manufacturing and drive profitable growth.”

The milestone demonstrates the potential of future full-scale industrialization of SiC on 300-millimeter wafers. Infineon will plan the 300-millimeter SiC technology and ramp timing in close collaboration with its customers and partners, while further executing on its 200-millimeter SiC manufacturing roadmap. Advanced SiC power technology provides Infineon customers with a cost-effective and secure supply base for automotive, renewable energy, industrial and AI data center applications.

SiC is a key semiconductor material for highly efficient power conversion. Its material properties enable lower power loss, higher power density and efficient operation at high voltages and temperatures for example in traction inverters, on-board chargers, EV chargers, large scale energy storage and industrial drives as well as uninterruptible power supplies. Demand is also rising in AI data centers with new roles for SiC in solid-state transformers, circuit breakers and power supply units. Infineon addresses these applications with a broad CoolSiC™ portfolio.

In parallel, Infineon has also successfully proofed the feasibility of its Cold Split technology with 300-millimeter SiC at its Dresden, Germany, site. Cold Split separates wafers from a SiC boule with less material loss and substantially reduced processing time than conventional wire sawing, so more wafers can be obtained from the same crystal with compared to less capital expenditure. Both developments position Infineon well to scale SiC technology in line with market demand and meet the evolving needs of its customers.

Infineon manufactures semiconductors based on all three relevant materials: silicon, silicon carbide and gallium nitride. On 27 October 2026, the company announced an approximately €1.1 billion investment in a high-volume manufacturing facility for GaN power semiconductors on 300-millimeter wafers in Villach. This SiC achievement extends this approach to a second wide-bandgap material and reinforces Infineon’s position as an innovation leader in semiconductor manufacturing.

Infineon at electronica 2026

Infineon will show the public the world's first processed 300-millimeter SiC wafer at the electronica trade show in Munich. From 10 to 13 November, Infineon will present innovative and energy-efficient solutions for an increasingly intelligent and connected world in Hall C3, Booth 502. More information is available at www.infineon.com/electronica.

联系我们 contact @ memedata.com