首个二维非硅基计算机研制成功
First 2D, non-silicon computer developed

原始链接: https://www.psu.edu/news/research/story/worlds-first-2d-non-silicon-computer-developed

研究人员研制出一台基于二维材料的功能性计算机,这是替代电子学领域的一项重大进展。他们利用金属有机化学气相沉积法(MOCVD)制造了二硫化钼和二硒化钨晶体管,成功地调节了它们的阈值电压,从而创建了CMOS逻辑电路。这台二维CMOS计算机在低电源电压下运行,功耗极低,能够以高达25千赫兹的频率执行简单的逻辑运算。虽然速度比硅基计算机慢,但其单指令集架构证明了二维材料的潜力。一个用实验数据校准的计算模型,将它的性能与硅基计算机进行了基准测试,揭示了优化的空间。研究人员强调,与硅的几十年发展相比,二维材料技术的进步速度很快。宾夕法尼亚州立大学的二维晶体联盟材料创新平台(2DCC-MIP)为这项研究提供了重要的资源。团队强调持续的联邦资助对于保持创新至关重要。

Hacker News上的一篇讨论围绕着首台使用二硫化钼(n型晶体管)和二硒化钨(p型晶体管)的二维非硅计算机的开发展开。用户们讨论了这台计算机的潜力、局限性以及与现有技术的比较。初始工作频率约为25 kHz,推测受到寄生电容的限制,可以通过工艺改进加以提升。一些用户思考这种材料是否可以被想要制作自己集成电路的业余爱好者使用。 一些评论探讨了与硅相比使用这些材料的优缺点,包括更高的熔点和独特的电子带隙特性。光子计算机也被拿来比较。在量产的背景下,钨相对于硅的成本和可获得性也受到了讨论。研究论文中非传统的插图因其对材料的混淆性表达而受到批评。
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原文

The team used metal-organic chemical vapor deposition (MOCVD) — a fabrication process that involves vaporizing ingredients, forcing a chemical reaction and depositing the products onto a substrate — to grow large sheets of molybdenum disulfide and tungsten diselenide and fabricate over 1,000 of each type of transistor. By carefully tuning the device fabrication and post-processing steps, they were able to adjust the threshold voltages of both n- and p-type transistors, enabling the construction of fully functional CMOS logic circuits.

“Our 2D CMOS computer operates at low-supply voltages with minimal power consumption and can perform simple logic operations at frequencies up to 25 kilohertz,” said first author Subir Ghosh, a doctoral student pursuing a degree in engineering science and mechanics under Das’s mentorship.

Ghosh noted that the operating frequency is low compared to conventional silicon CMOS circuits, but their computer — known as a one instruction set computer — can still perform simple logic operations.

“We also developed a computational model, calibrated using experimental data and incorporating variations between devices, to project the performance of our 2D CMOS computer and benchmark it against state-of-the-art silicon technology,” Ghosh said. “Although there remains scope for further optimization, this work marks a significant milestone in harnessing 2D materials to advance the field of electronics.”

Das agreed, explaining that more work is needed to further develop the 2D CMOS computer approach for broad use, but also emphasizing that the field is moving quickly when compared to the development of silicon technology.

“Silicon technology has been under development for about 80 years, but research into 2D materials is relatively recent, only really arising around 2010,” Das said. “We expect that the development of 2D material computers is going to be a gradual process, too, but this is a leap forward compared to the trajectory of silicon.”

Ghosh and Das credited the 2D Crystal Consortium Materials Innovation Platform (2DCC-MIP) at Penn State with providing the facilities and tools needed to demonstrate their approach. Das is also affiliated with the Materials Research Institute, the 2DCC-MIP and the Departments of Electrical Engineering and of Materials Science and Engineering, all at Penn State. Other contributors from the Penn State Department of Engineering Science and Mechanics include graduate students Yikai Zheng, Najam U. Sakib, Harikrishnan Ravichandran, Yongwen Sun, Andrew L. Pannone, Muhtasim Ul Karim Sadaf and Samriddha Ray; and Yang Yang, assistant professor. Yang is also affiliated with the Materials Research Institute and the Ken and Mary Alice Lindquist Department of Nuclear Engineering at Penn State. Joan Redwing, director of the 2DCC-MIP and distinguished professor of materials science and engineering and of electrical engineering, and Chen Chen, assistant research professor, also co-authored the paper. Other contributors include Musaib Rafiq and Subham Sahay, Indian Institute of Technology; and Mrinmoy Goswami, Jadavpur University.

The U.S. National Science Foundation, the Army Research Office and the Office of Naval Research supported this work in part.

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